Company History
- Nov 1975: NIPPON ELECS Devices Corp. formed with a capital of 35 million yen
- Feb 1985: First development of Line Scan Cameras
- Apr 1985: Company capital increased to 98 million yen
- Apr 1986: Established Tokyo Sales Office
- Jun 1991: Name of company changed to Nippon Electro-Sensory Devices Corporation (NED)
- Jun 1992: Established Nishi-Nippon Sales Office in Hakata, Fukuoka
- Jun 1995: Development of 3CCD Colour Line Camera
- Aug 1996: Development of High Speed Frame Grabber Boards
- Dec 1996: Development of Wafer Inspection Devices
- Feb 2002: Achieved ISO 9001 Certification
- May 2005: In-house development of high speed CMOS line sensors
- Sep 2005: Osaka Head Office moved to Head Office Building, Nishi-ku, Osaka
- Jan 2006: Achieved ISO 1400 Certification
- Feb 2010: Established Taipei Office